The +7KV ion vacuum pump 2L-50 is an advanced sputter ion pump with a pumping speed of 65L/S for air and 0.6L/S for argon. Featuring CF100 flange and a working voltage of +7KV, this pump provides ultra-high vacuum performance with zero vibration and zero noise. Ideal for scientific and industrial ultra-high vacuum applications.
The +7KV ion vacuum pump 2L-50 is a high-performance sputter ion pump designed for ultra-high vacuum applications. Featuring zero vibration, zero noise, and a clean oil-free operation, this pump ensures a stable and reliable vacuum environment. It is widely used in high-energy particle accelerators, controlled nuclear fusion devices, and semiconductor manufacturing.
The sputter ion pump is an essential vacuum device for achieving ultra-clean, ultra-high vacuum conditions. As an oil-free ultra-high vacuum system’s main pump, it operates in a sealed system without requiring continuous fore-pump operation.
Ultra-high vacuum capability
Zero vibration for precision applications
Noise-free operation
Clean and contamination-free vacuum
Easy to operate and maintain
Model | 2L-50 |
Flange | DN100CF |
Pumping Speed (Air) | 65 L/s |
Pumping Speed (Argon) | 0.6 L/s |
Start-up Pressure (Pa) | ≤5×10⁻⁴ |
Ultimate Pressure (Pa) | 7×10⁻⁸ |
Baking Temperature (℃) | <200 |
Magnetic or Non-magnetic | <300 |
Operating Voltage (KV) | 7 |
Electrode Units | 2 |
Mounting Dimensions (mm) | 90×90 (4-M6) |
Overall Dimensions (mm) | 290×120×299 |
Weight (kg) | 22 |
High-energy particle accelerators
Controlled nuclear fusion devices
Electro-vacuum devices
Semiconductor material processing
Electron microscopes
Mass spectrometers
The +7KV ion vacuum pump 2L-50 is designed to achieve and maintain ultra-high vacuum conditions for various scientific and industrial applications.
The sputter ion pump utilizes a Penning discharge process within a magnetic and electric field to ionize gas molecules, which are then trapped on titanium cathode plates.
Ion pumps provide oil-free, contamination-free operation with zero vibration and noise, making them ideal for high-precision applications.
The ultimate pressure achievable is 7×10⁻⁸ Pa, which is suitable for ultra-high vacuum applications.
The ion pump is effective for pumping residual gases such as nitrogen, oxygen, and argon, though its efficiency varies depending on the gas type.
The +7KV ion vacuum pump 2L-50 operates at +7KV to sustain its ionization process.
Yes, it is designed for continuous operation in ultra-high vacuum environments.
Industries such as semiconductor manufacturing, space research, nuclear physics, and advanced material science benefit from ion vacuum pumps.
No, it requires minimal maintenance as it does not contain moving parts.
Yes, ion pumps are typically used in conjunction with roughing and turbo pumps to establish the desired ultra-high vacuum environment.
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