Professional 7KV Starcell Ion Pump 2L-200B: The Ultimate Solution for Electric Vacuum Systems

Discover the 7KV Starcell Ion Pump 2L-200B, designed for electric vacuum systems, offering 230L/s pumping speed, ultra-high vacuum (2.7E-8Pa), oil-free operation, and zero vibration for precision applications.

7KV Starcell Ion Pump 2L-200B: High-Performance Vacuum Solution for Electric Systems

Product Overview

The 7KV Starcell Ion Pump 2L-200B is a high-efficiency sputter ion pump designed for electric vacuum systems, delivering ultra-high vacuum (UHV) performance. With a DN150CF flange, it achieves a pumping speed of 230L/s (air) and an ultimate vacuum of 2.7×10^-8Pa, making it perfect for oil-free, low-noise, and vibration-free applications.

Key Advantages

Oil-Free Operation – No contamination risk, ensuring a clean vacuum environment.
 Ultra-High Vacuum – Reaches 2.7×10^-8Pa, suitable for critical UHV applications.
 Silent & Vibration-Free – Ideal for sensitive scientific instruments.
 No Continuous Backing Pump Required – Reduces operational costs.
 High-Temperature Resistance – Bakeable up to 200°C (magnetic) or 300°C (non-magnetic).

Technical Specifications

Applications

Particle Physics – Accelerators, synchrotron radiation systems.

Semiconductor Manufacturing – Wafer processing, thin-film deposition.

Scientific Research – Electron microscopes, mass spectrometers, fusion experiments.

Industrial Vacuum – Precision coating, vacuum metallurgy.

7KV Starcell Ion Pump 2L-200B – Frequently Asked Questions (FAQ)

1. What electric vacuum systems is the 7KV ion pump suitable for?

It is ideal for particle accelerators, semiconductor equipment, and electron microscopes requiring ultra-high vacuum.

2. What is the ultimate vacuum of the Starcell 2L-200B ion pump?

It achieves 2.7×10^-8Pa, making it perfect for UHV applications.

3. Does the 2L-200B ion pump need a backing pump?

No, it operates independently without a continuous backing pump.

4. What is the flange type of the DN150CF ion pump?

It uses a standard DN150CF flange, compatible with most UHV systems.

5. Is the 7KV operating voltage stable?

Yes, the 7KV power supply ensures efficient and stable ion sputtering.

6. What is the maximum bakeout temperature for this UHV pump?

With magnet: ≤200°C

Non-magnetic version: ≤300°C

7. What gases can the 230L/s ion pump handle?

Optimized for air (230L/s), with 2.4L/s for argon.

8. How long does the oil-free ion pump last?

With no mechanical wear, it offers long service life and low maintenance.

9. Why is a sputter ion pump preferred in semiconductor manufacturing?

It ensures contamination-free vacuum, crucial for wafer processing and thin-film deposition.

10. How to choose an ion pump for scientific vacuum systems?

Consider pumping speed, ultimate vacuum, and flange compatibility—the 2L-200B is an excellent choice.